Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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55 results for Nicolas Loubet

Impact of Gate Stack Thermal Budget on NBTI Reliability in Gate-All-Around Nanosheet P-type Devices
- - Huimei Zhou
  - Miaomiao Wang
  - et al.
- 2023
- IRPS 2023
Precession Electron Diffraction (PED) Strain Characterization in Stacked Nanosheet FET Structure
- - Juntao Li
  - Shogo Mochizuki
  - et al.
- 2022
- ISTFA 2022
Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors
- - Curtis Durfee
  - Subhadeep Kal
  - et al.
- 2021
- ECS Meeting 2021
Enabling Next Generation CMOS by Novel EOT Scaling Module
- - Lin Dong
  - Steven Hung
  - et al.
- 2021
- VLSI Technology 2021
Dual Damascene BEOL Extendibility With Cu Reflow / Selective TaN And Co/Cu Composite
- - P. Bhosale
  - N. Lanzillo
  - et al.
- 2021
- VLSI Technology 2021
In-line Raman spectroscopy for stacked nanosheet device manufacturing
- - Daniel Schmidt
  - C. Durfee
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Parasitic Resistance Reduction for Aggressively Scaled Stacked Nanosheet Transistors
- - Su-Chen Fan
  - Ruilong Xie
  - et al.
- 2020
- IITC 2020
Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- ASMC 2020
Composite Interconnects for High-Performance Computing beyond the 7nm Node
- - P. Bhosale
  - S. Parikh
  - et al.
- 2020
- VLSI Technology 2020
Structural and Electrical Demonstration of SiGe Cladded Channel for PMOS Stacked Nanosheet Gate-All-Around Devices
- - Shogo Mochizuki
  - B. Colombeau
  - et al.
- 2020
- VLSI Technology 2020