Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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31 results for Sean Burns

Optimization of pitch-split double patterning phoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- ASMC 2011
Spacer-defined double patterning for 20-nm and beyond logic BEOL technology
- - Ryoung-Han Kim
  - Chiew-Seng Koay
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
- - Martin Burkharde
  - J.C. Arnold
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Graded spin-on organic bottom antireflective coating for high NA lithography
- - Dario L. Goldfarb
  - Sean D. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008
32 NM Logic patterning options with immersion lithography
- - K. Lai
  - S. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Dark field Double Dipole Lithography (DDL) for back-end-of-line processes
- - M. Burkhardt
  - Sean Burns
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- - Ratnam Sooriyakumaran
  - Hoa Truong
  - et al.
- 2005
- Microlithography 2005
Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- - Hiroshi Ito
  - Hoa D. Truong
  - et al.
- 2005
- Microlithography 2005