Voltage ramp stress based stress-and-sense test method for reliability characterization of Hf-base high-k/metal gate stacks for CMOS technologies
- E. Cartier
- Andreas Kerber
- et al.
- 2011
- ECS Meeting 2011
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40 results for A. Kerber
Fast characterization of the Static Noise Margin degradation of cross-coupled inverters and correlation to BTI instabilities in MG/HK devices
- Andreas Kerber
- N. Pimparkar
- et al.
- 2011
- IRPS 2011
Correlation of Id- and Ig-random telegraph noise to positive bias temperature instability in scaled high-κ/metal gate n-type MOSFETs
- Chia-Yu Chen
- Qiushi Ran
- et al.
- 2011
- IRPS 2011
PBTI under dynamic stress: From a single defect point of view
- K. Zhao
- J.H. Stathis
- et al.
- 2011
- IRPS 2011
Thermal stability of copper contact metallization using Ru-containing liner
- Soon-Cheon Seo
- C.-C. Yang
- et al.
- 2011
- Electrochemical and Solid-State Letters
Impact of charge trapping on the voltage acceleration of TDDB in metal gate/high-k n-channel MOSFETs
- A. Kerber
- A. Vayshenker
- et al.
- 2010
- IRPS 2010
PBTI relaxation dynamics after ac VS. DC stress in high-K/metal gate stacks
- K. Zhao
- J.H. Stathis
- et al.
- 2010
- IRPS 2010
A Fast four-point sense methodology for extraction of circuit-relevant degradation parameters
- Andreas Kerber
- Eduard Cartier
- 2010
- IEEE Electron Device Letters
Extraction of effective oxide thickness for SOI FINFETs with high-κ/Metal gates using the body effect
- Sujata Paul
- Frank Yeh
- et al.
- 2010
- IEEE Electron Device Letters
Voltage ramp stress for bias temperature instability testing of metal-gate/high- k stacks
- Andreas Kerber
- Siddarth A. Krishnan
- et al.
- 2009
- IEEE Electron Device Letters