Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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120 results for William D. Hinsberg
Characterization of photoresist spatial resolution by interferometric lithography
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Using the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers
- Hiroshi Ito
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Water vapor uptake in photolithographic polymers observed by infrared near-field scanning optical microscopy in a controlled environment
- Laurie A. McDonough
- Bogdan Dragnea
- et al.
- 2003
- Journal of Physical Chemistry B
Use of interferometric lithography to characterize the spatial resolution of a photoresist film
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- J. Photopolym. Sci. Tech.
High numerical aperture lithographic imagery at the Brewster angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Selective sorption of nanoporous poly(methyl silsesquioxane)
- Ho-Cheol Kim
- Jason B. Wilds
- et al.
- 2002
- Chemistry of Materials
Method of measuring the spatial resolution of a photoresist
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 2002
- Optics Letters