Optimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
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101 results for Gregory M. Wallraff
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Patterned nanoporous poly(methylsilsesquioxane) thin films: A potential high density substrate
- Zach L. Hogan
- Cortney R. Kreller
- et al.
- 2004
- Materials Science and Engineering C
Photopatterned nanoporous media
- Ho-Cheol Kim
- Gregory Wallraff
- et al.
- 2004
- Nano Letters
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Stable and efficient fluorescent red and green dyes for external and internal conversion of blue OLED emission
- Sally A. Swanson
- Greg M. Wallraff
- et al.
- 2003
- Chemistry of Materials
Studies of Chain Conformational Kinetics in Poly(di-n-alkylsilanes). 5. The Effect of Side-Chain Structure on Piezochromism
- K. Song
- R.D. Miller
- et al.
- 2002
- Macromolecules
Photodegradation of Poly(dialkylsilane)s In Solution: The Persistent Radicals Have an Unexpected Structure
- Allan J. McKinley
- Takashi Karatsu
- et al.
- 2002
- Organometallics
Spectroscopic Characterization of Piezochromism in Poly(Alkylsilanes): Poly(di-o-hexylsilane)
- K. Song
- H. Kuzmany
- et al.
- 2002
- Macromolecules