Experimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
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101 results for Gregory M. Wallraff
High resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm
- Juliann Opitz
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
Application of semiconductor lithography to the fabrication of oligonucleotide arrays
- G.M. Wallraff
- Jeff W. Labadie
- et al.
- 1996
- IS&T Annual Conference 1996
193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Kinetics of chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1995
- Microlithography 1995
Polysilanes. Synthesis, structure and thermochromic behavior
- R.D. Miller
- G.M. Wallraff
- et al.
- 1991
- ACS Division of Polymer Chemistry Atlanta Meeting 1991
Structure of dialkyl and diaryl substituted organosilane polymers in solution
- P.M. Cotts
- P. Shukla
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990