Polymeric silicon‐containing resist materials
- R.D. Miller
- G.M. Wallraff
- 1994
- Advanced Materials for Optics and Electronics
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101 results for Gregory M. Wallraff
193 nm resists and lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1994
- Polymers for Advanced Technologies
Designing high performance KrF and ArF single layer resists with methacrylate polymers
- Robert D. Allen
- Gregory M. Wallraff
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Chemically amplified photoresist for visible laser direct imaging
- G.M. Wallraff
- R.D. Allen
- et al.
- 1991
- ACS Spring 1991
Synthesis and lithographic performance of photosensitive poly(phenylquinoxaline)s and related structures
- G.M. Wallraff
- J.L. Hedrick
- et al.
- 1991
- ACS Spring 1991
Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists
- R.D. Allen
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Base-catalyzed photosensitive polyimide
- D.R. McKean
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Sensitive polysilane resists for bilayer lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1991
- ACS Spring 1991
Fluorescence quenching of poly(methylphenylsilane) in solution
- Gregory M. Wallraff
- Mark Baier
- et al.
- 1992
- Journal of Inorganic and Organometallic Polymers
Models for polysilane high polymers. Room-temperature solution fluorescence quenching in linear Si10Me22, Si16Me34 and poly(methylpropylsilane) by carbon tetrachloride
- Ya-Ping Sun
- Gregory M. Wallraff
- et al.
- 1992
- Journal of Photochemistry and Photobiology, A: Chemistry