Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
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101 results for Gregory M. Wallraff
The effect of humidity on deprotection kinetics in chemically amplified resists
- Sean D. Burns
- David R. Medeiros
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Silicon-containing resists for 157 nm applications
- Ratnam Sooriyakumaran
- Debra Fenzel-Alexander
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Development of 157 nm positive resists
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2001
- IBM J. Res. Dev
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Lithographic Imaging Techniques for the Formation of Nanoscopic Features
- G.M. Wallraff
- W.D. Hinsberg
- 1999
- Chemical Reviews
Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures