Publications

3 results for Martin Burkhardt

Evaluating Novel Material Stacks Towards Gate Width Roughness Reduction
- - Gopal Kenath
  - Martin Burkhardt
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
EUV patterned gate variation reduction in next generation transistor architectures
- - Gopal Kenath
  - Martin Burkhardt
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Scaling opportunities for Gate-All-Around and beyond: A patterning perspective
- - Indira Seshadri
  - Eric Miller
  - et al.
- 2023
- IEDM 2023