Copper dual damascene wiring for sub-0.25 μm CMOS technology
- J. Heidenreich
- D. Edelstein
- et al.
- 1998
- IITC 1998
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18 results for Naftali Lustig
Full copper wiring in a sub-0.25 μm CMOS ULSI technology
- D. Edelstein
- J. Heidenreich
- et al.
- 1997
- IEDM 1997
Thermal stability and electrical properties of hydrogenated amorphous carbon film
- A.C. Callegari
- D.A. Buchanan
- et al.
- 1994
- Applied Physics Letters
Oxygen assisted ohmic contact formation mechanism to n-type GaAs
- Naftali Lustig
- R.G. Schad
- 1992
- Applied Physics Letters
Low Au content thermally stable NiGe(Au)W ohmic contacts to n-type GaAs
- Naftali Lustig
- Masanori Murakami
- et al.
- 1991
- Applied Physics Letters
Thermally stable, low-resistance NiInWNx ohmic contacts to n-type GaAs prepared by sputter deposition
- Masanori Murakami
- Naftali Lustig
- et al.
- 1991
- Applied Physics Letters
Gate dielectric and contact effects in hydrogenated amorphous silicon-silicon nitride thin-film transistors
- Naftali Lustig
- Jerzy Kanicki
- 1989
- Journal of Applied Physics
Variable range hopping conductivity in hydrogenated amorphous silicon thin film transistors
- N. Lustig
- W.E. Howard
- 1989
- Solid State Communications