Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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48 results for Paul Ronsheim

Synthesis and control of ultra thin gate oxides for the 90 and 65 NM nodes
- - Joseph F. Shepard Jr.
  - Anthony Chou
  - et al.
- 2005
- RTP 2005
An overview of 300mm SOI starting wafer quality and its yield detractors
- - Pei Y. Tsai
  - Marlene Almonte
  - et al.
- 2005
- ISTFA 2005
Retardation of arsenic diffusion in silicon-germanium by co-implantation
- - Omer Dokumaci
  - Paul Ronsheim
  - et al.
- 2004
- ECS Meeting 2004
Sub-30 NM abrupt junction formation in strained silicon/silicon-germanium CMOS device
- - K.-L. Lee
  - F. Cardone
  - et al.
- 2004
- ECS Meeting 2004
Thermally robust dual-work function ALD-MN _x MOSFETs using conventional CMOS process flow
- - D.-G. Park
  - Z. Luo
  - et al.
- 2004
- VLSI Technology 2004
Strained Si CMOS (SS CMOS) technology: Opportunities and challenges
- - K. Rim
  - R. Anderson
  - et al.
- 2003
- Solid-State Electronics
Modeling of the diffusion of implanted boron in strained Si/Si_1-xGe_x
- - Huilong Zhu
  - Kam-Leung Lee
  - et al.
- 2002
- SISPAD 2002
Backside sputter depth profiling of phosphorus diffusion from a polysilicon source
- - P.A. Ronsheim
  - D. Chidambarrao
  - et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Strained Si NMOSFETs for high performance CMOS technology
- - K. Rim
  - S.J. Koester
  - et al.
- 2001
- VLSI Technology 2001
Effect of plasma N₂ and thermal NH₃ nitridation in HfO₂ for ultrathin equivalent oxide thickness
- - Min Dai
  - Yanfeng Wang
  - et al.
- 2013
- Journal of Applied Physics