Low temperature hydrogen induced degradation of (Ba,Sr)TiO3 thin film capacitors
- J.D. Baniecki
- C. Parks
- et al.
- 1999
- MRS Proceedings 1999
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17 results for G. Costrini
Cleans for Al vias in a 0.175 μm Dual Damascene Process
- J.P. Gambino
- L. Clevenger
- et al.
- 1999
- IITC 1999
Evaluation of Cu wiring in a production 64 Mb DRAM
- W. Cote
- G. Costrini
- et al.
- 1998
- VLSI Technology 1998
Dielectric anti-reflection coating application in a 0.175 μm dual-damascene process
- G.Y. Lee
- Z.G. Lu
- et al.
- 1998
- IITC 1998
Submicrometer Platinum Electrodes by Through-Mask Plating
- K.L. Saenger
- G. Costrini
- et al.
- 2001
- JES
Electromigration in AlCu lines: Comparison of Dual Damascene and metal reactive ion etching
- R. Filippi
- M. Gribelyuk
- et al.
- 2001
- Thin Solid Films
Aluminum dual damascene metallization for 0.175 μm DRAM generations and beyond
- R.F. Schnabel
- L. Clevenger
- et al.
- 2000
- Microelectronic Engineering