Suppression of boron diffusion in deep submicron devices
- Michael A. Gribelyuk
- Phil Oldiges
- et al.
- 2011
- Journal of Vacuum Science and Technology B
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45 results for M. Gribelyuk
Ni-Pt silicide formation through Ti mediating layers
- Paul Besser
- Christian Lavoie
- et al.
- 2007
- Microelectronic Engineering
Interfacial microstructure of NiSix/HfO2/SiOx/Si gate stacks
- M. Gribelyuk
- C. Cabral Jr.
- et al.
- 2007
- Thin Solid Films
In situ investigation of growth and thermal stability of ultrathin Si layers on the HfO 2/Si (100) high- κ dielectric system
- Yu.Yu. Lebedinskii
- A. Zenkevich
- et al.
- 2005
- Applied Physics Letters
Interfacial oxide formation and oxygen diffusion in rare earth oxide-silicon epitaxial heterostructures
- V. Narayanan
- S. Guha
- et al.
- 2002
- Applied Physics Letters
Thermal stability of polycrystalline silicon/metal oxide interfaces
- A.C. Callegari
- E. Gousev
- et al.
- 2002
- Applied Physics Letters
Interface reactions in ZrO 2 based gate dielectric stacks
- M. Gribelyuk
- A.C. Callegari
- et al.
- 2002
- Journal of Applied Physics
Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films
- A.C. Callegari
- E. Cartier
- et al.
- 2001
- Journal of Applied Physics
Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates
- Tiezhong Ma
- Stephen A. Campbell
- et al.
- 2001
- IEEE Transactions on Electron Devices
Electromigration in AlCu lines: Comparison of Dual Damascene and metal reactive ion etching
- R. Filippi
- M. Gribelyuk
- et al.
- 2001
- Thin Solid Films