Evolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
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88 results for Phil Brock
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Fluoropolymer platforms for 157 nm resist applications
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- International Conference on Microprocesses and Nanotechnology 2001
Charge transport in TiO2/MEH-PPV polymer photovoltaics
- A.J. Breeze
- Z. Schlesinger
- et al.
- 2001
- Physical Review B - CMMP
Charge transport in (formula presented) polymer photovoltaics
- A.J. Breeze
- Z. Schlesinger
- et al.
- 2001
- Physical Review B - CMMP
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Structure and optical properties of several organic-inorganic hybrids containing corner-sharing chains of bismuth iodide octahedra
- D.B. Mitzi
- P.J. Brock
- 2001
- Inorganic Chemistry