Effect of resist components on image spreading during postexposure bake of chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2000
- Microlithography 2000
Publications
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88 results for Phil Brock
Experimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Molecular weight tailoring in methacrylate 193 nm photoresists
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
High resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
- Thomas I. Wallow
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Injection, transport and recombination in organic light-emitting diodes
- J.C. Scott
- George G. Malliaras
- et al.
- 1998
- SPIE Optical Science, Engineering, and Instrumentation 1998
Application of semiconductor lithography to the fabrication of oligonucleotide arrays
- G.M. Wallraff
- Jeff W. Labadie
- et al.
- 1996
- IS&T Annual Conference 1996
Positive tone dry-develop resist based on cross-linking a phenolic resin
- Scott A. MacDonald
- C.B. Larson
- et al.
- 1993
- Microlithography 1993
Fabrication of grooved-glass substrates by phase-mask lithography
- P.J. Brock
- M. Levenson
- et al.
- 1991
- Microlithography 1991