Molecular weight tailoring in methacrylate 193 nm photoresists
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
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88 results for Phil Brock
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Temperature-dependent recombination in polymer composite light-emitting diodes
- L.D. Bozano
- S.E. Tuttle
- et al.
- 1998
- Applied Physics Letters
Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Injection, transport and recombination in organic light-emitting diodes
- J.C. Scott
- George G. Malliaras
- et al.
- 1998
- SPIE Optical Science, Engineering, and Instrumentation 1998
New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
- Thomas I. Wallow
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Electrical characteristics and efficiency of single-layer organic light-emitting diodes
- George G. Malliaras
- J.R. Salem
- et al.
- 1998
- Physical Review B - CMMP
Photovoltaic measurement of the built-in potential in organic light emitting diodes and photodiodes
- George G. Malliaras
- J.R. Salem
- et al.
- 1998
- Journal of Applied Physics
Platform-dependent properties of 193nm single layer resists
- Robert D. Allen
- Thomas I. Wallow
- et al.
- 1998
- J. Photopolym. Sci. Tech.
Enhanced luminance in polymer composite light emitting devices
- S.A. Carter
- J.C. Scott
- et al.
- 1997
- Applied Physics Letters