65nm CMOS technology for low power applications
- A. Steegen
- R. Mo
- et al.
- 2005
- IEDM 2005
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18 results for R. Mann
Fluctuation limits & scaling opportunities for CMOS SRAM cells
- Azeez Bhavnagarwala
- Stephen Kosonocky
- et al.
- 2005
- IEDM 2005
High performance and low power transistors integrated in 65nm bulk CMOS technology
- Z. Luo
- A. Steegen
- et al.
- 2004
- IEDM 2004
In-situ X-ray diffraction analysis of TiSi2 phase formation from a titanium-molybdenum bilayer
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1996
- MRS Fall Meeting 1996
Titanium silicides and their technological applications
- L. Clevenger
- R. Mann
- 1993
- MRS Fall Meeting 1993
High performance bulk planar 20nm CMOS technology for low power mobile applications
- Huiling Shang
- Sameer Jain
- et al.
- 2012
- VLSI Technology 2012
Optimization of DUV lithography for high-energy well implantation
- Ryan Deschner
- Seong-Dong Kim
- et al.
- 2007
- SPIE Advanced Lithography 2007
SRAM Cell Design for Stability Methodology
- Clement Wann
- Robert Wong
- et al.
- 2005
- VLSI Technology 2005
Trimming of hard-masks by gaseous chemical oxide removal (COR) for sub-10nm gates/fins, for gate length control and for embedded logic
- Wesley C. Natzle
- David Horak
- et al.
- 2004
- ASMC 2004
Enhanced multi-threshold (MTCMOS) circuits using variable well bias
- S.V. Kosonocky
- M.J. Immediato
- et al.
- 2001
- ISLPED 2001