Silicide formation in Ti-Si and Co-Si reactions
- L. Clevenger
- Q.Z. Hong
- et al.
- 1993
- MRS Proceedings 1993
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18 results for R. Mann
Low temperature formation of C54-TiSi2 using titanium alloys
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1997
- Applied Physics Letters
Lowering the formation temperature of the C54-TiSi2 phase using a metallic interfacial layer
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1997
- Journal of Materials Research
Reduction of the C54-TiSi2 phase transformation temperature using refractory metal ion implantation
- R. Mann
- G.L. Miles
- et al.
- 1995
- Applied Physics Letters
Study of C49-TiSi2 and C54-TiSi2 formation on doped polycrystalline silicon using in situ resistance measurements during annealing
- L. Clevenger
- R. Mann
- et al.
- 1994
- Journal of Applied Physics
The C49 to C54 Phase Transformation in TiSi2Thin Films
- L. Clevenger
- R. Mann
- 1994
- JES
The C49 to C54-TiSi2 transformation in self-aligned silicide applications
- R. Mann
- L. Clevenger
- et al.
- 1993
- Journal of Applied Physics
Kinetic analysis of C49-TiSi2 and C54-TiSi2 formation at rapid thermal annealing rates
- L. Clevenger
- J.M.E. Harper
- et al.
- 1992
- Journal of Applied Physics