Dual workfunction fully silicided metal gates
- C. Cabral Jr.
- J. Kedzierski
- et al.
- 2004
- VLSI Technology 2004
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16 results for Roy Carruthers
Fabrication and Mobility Characteristics of Ultra-thin Strained Si Directly on Insulator (SSDOI) MOSFETs
- K. Rim
- K.K. Chan
- et al.
- 2003
- IEDM 2003
Metal-gate FinFET and fully-depleted SOI devices using total gate silicidation
- Jakub Kedzierski
- Edward Nowak
- et al.
- 2002
- IEDM 2002
In situ and ex situ measurements of stress evolution in the cobalt-silicon system
- G.A. Lucadamo
- C. Lavoie
- et al.
- 2001
- Materials Research Society Symposium - Proceedings
Pb-free solder alloys for flip chip applications
- S.K. Kang
- J. Horkans
- et al.
- 1999
- ECTC 1999
Electromigration in 0.25 μm wide Cu line on W
- C.-K. Hu
- K.Y. Lee
- et al.
- 1997
- Thin Solid Films