Speciation, luminescence, and alkaline fluorescence quenching of 4-(2-methylbutyl)aminodipicolinic acid (h 2mebadpa)
- Andrew J. Ingram
- Alexander G. Dunlap
- et al.
- 2011
- Journal of Physical Chemistry A
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46 results for Richard Dipietro
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Probe-based ultrahigh-density storage technology
- 2008
- IBM J. Res. Dev
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2007
- SPIE Advanced Lithography 2007
Admittance spectroscopy of polymer-nanoparticle nonvolatile memory devices
- D.T. Simon
- M.S. Griffo
- et al.
- 2006
- Applied Physics Letters
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- R.D. Allen
- G. Breyta
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Vinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
IBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
Electroluminescent devices based on cross-linked polymer blends
- Luisa D. Bozano
- Kenneth R. Carter
- et al.
- 2003
- Journal of Applied Physics