Minimizing linewidth roughness in Step and Flash Imprint Lithography
- Niyaz Khusnatdinov
- Gerard M. Schmid
- et al.
- 2008
- Microelectronic Engineering
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55 results for Y. Zhang
High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processing
- M. Chudzik
- B. Doris
- et al.
- 2007
- VLSI Technology 2007
Polymer self assembly in semiconductor microelectronics
- Charles T. Black
- Ricardo Ruiz
- et al.
- 2007
- IBM J. Res. Dev
Self-aligned, self-assembled organosilicate line patterns of ∼20nm half-pitch from block copolymer mediated self-assembly
- Ho-Cheol Kim
- Joy Cheng
- et al.
- 2007
- SPIE Advanced Lithography 2007
Local defectivity control of 2D self-assembled block copolymer patterns
- Ricardo Ruiz
- Niranjana Ruiz
- et al.
- 2007
- Advanced Materials
Directed assembly of lamellae-forming block copolymers by using chemically and topographically patterned substrates
- Sang-Min Park
- Mark P. Stoykovich
- et al.
- 2007
- Advanced Materials
Highly porous silicon membrane fabrication using polymer self-assembly
- C.T. Black
- K.W. Guarini
- et al.
- 2006
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Polymer self assembly in semiconductor microelectronics
- C.T. Black
- K.W. Guarini
- et al.
- 2006
- IEDM 2006
Investigation of FinFET devices for 32nm technologies and beyond
- H. Shang
- L. Chang
- et al.
- 2006
- VLSI Technology 2006
Silicon-on-insulator MOSFETs with hybrid crystal orientations
- M. Yang
- K.K. Chan
- et al.
- 2006
- VLSI Technology 2006