Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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85 results for Frances A. Houle
Visible laser-induced nucleation and growth of Cr, Mo, and W films from the hexacarbonyls. Reactivity of CO on film surfaces
- F.A. Houle
- K.A. Singmaster
- 2002
- Journal of Physical Chemistry
High NA lithographic imagery at Brewster's angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
EUV photoresist performance results from the VNL and the EUV LLC
- Jonathan Cobb
- Paul Dentinger
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
High numerical aperture-imaging implications for chemically amplified photoresists
- Martha I. Sanchez
- Frances A. Houle
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2001
- IBM J. Res. Dev
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Liquid immersion deep-ultraviolet interferometric lithography
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
In situ Fourier transform infrared spectroscopy and stochastic modeling of surface chemistry of amorphous silicon growth
- U. Wetterauer
- J. Knobloch
- et al.
- 1998
- Journal of Applied Physics