ENHANCED DIFFUSION IN SHORT TIME ANNEALED ARSENIC AND BORON ION IMPLANTED SILICON.
- T.O. Sedgwick
- S. Cohen
- et al.
- 1983
- VLSI Science and Technology 1983
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71 results for T.O. Sedgwick
SHORT TIME ANNEALING OF As AND B ION IMPLANTED Si USING TUNGSTEN-HALOGEN LAMPS.
- T.O. Sedgwick
- R. Kalish
- et al.
- 1983
- MRS Proceedings 1983
SHORT-TIME ANNEALING OF DRY-ETCHING DAMAGE.
- C.M. Ransom
- T.O. Sedgwick
- et al.
- 1983
- ECS Meeting 1983
Raman Scattering Spectroscopy Applied to the Study of Chemical Vapor Deposition Systems
- T.O. Sedgwick
- J.E. Smith
- 2019
- JES
Single Crystal Silicon Films on Amorphous Insulators: Growth by Lateral Nucleated Epitaxy Using Scanning Laser and Electron Beams and Evaluation by Electron Backscattering Contrast
- T.O. Sedgwick
- R.H. Geiss
- et al.
- 2019
- JES
Short Time Annealing of Coevaporated Tungsten Silicide Films
- T.O. Sedgwick
- F.M. d'Heurle
- et al.
- 2019
- JES
Short Time Annealing
- T.O. Sedgwick
- 2019
- JES
The Use of Gas Monitors to Characterize a Low-Temperature Atmospheric-Pressure Epitaxial System
- Paul D. Agnello
- Thomas O. Sedgwick
- 2019
- JES
Growth of Facet-Free Selective Silicon Epitaxy at Low Temperature and Atmospheric Pressure
- T.O. Sedgwick
- P. Agnello
- et al.
- 2019
- JES
Inhibition of Silicon Oxidation During Low Temperature Epitaxial Growth
- P.D. Agnelle
- T.O. Sedgwick
- 2019
- JES