Electron beam processing systems (a state of the art review)
- M. Hatzakis
- 2004
- Polymer Engineering & Science
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38 results for M. Hatzakis
Poly(4‐chlorostyrene), a new high contrast negative E‐beam resist
- J. Liutkus
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Organosilicon polymers for lithographic applications
- J.M. Shaw
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Epoxy resins for deep UV lithography
- K.J. Stewart
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
New method of observing electron penetration profiles in solids
- M. Hatzakis
- 2003
- Applied Physics Letters
1.75-GHz acoustic-surface-wave transducer fabricated by an electron beam
- A.N. Broers
- E.G. Lean
- et al.
- 2003
- Applied Physics Letters
Scanning differential interferometer to measure index heterogeneity
- Norman Bobroff
- Alan E. Rosenbluth
- et al.
- 1992
- Applied Optics
New High-Resolution and High-Sensitivity Deep UV, X-Ray, and Electron-Beam Resists
- M. Hatzakis
- K.J. Stewart
- et al.
- 1991
- JES
New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
- Michael Hatzakis
- Kevin J. Stewart
- et al.
- 1990
- Microelectronic Engineering
A simple bilayer lift-off process
- David F. Witman
- Jane M. Shaw
- et al.
- 1990
- Microelectronic Engineering