I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
The electron beam sensitivities of three different types of high molecular weight polysilmethylene polymers and copolymers were investigated. It was found that methyl derivatives of these polymers have high sensitivities to irradiation and have a negative tone. The influence of the molecular weight upon electron beam sensitivity was also investigated. In contrast to polysiloxanes, phenyl containing polysilmethylenes were found to have a much higher sensitivity (up to 10 ¢c for poly-1,1-diphenyl- 1-silacyclobutane) and comparable thermal stabilities (up to 400°C). It was found that some of these polymers have similar lithographic properties to the more common polysiloxanes. Mechanisms of crosslinking and degradation reactions of these polymers are discussed. © 1989.
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Ronald Troutman
Synthetic Metals
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989