In situ TEM analysis of TiSi2 C49-C54 transformations during annealing
- L. Gignac
- V. Svilan
- et al.
- 1996
- MRS Fall Meeting 1996
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84 results for Lawrence Clevenger
Formation of a crystalline metal-rich suicide in thin film titanium/silicon reactions
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1996
- Thin Solid Films
Phase formation in Cu(Sn) alloy thin films
- L. Clevenger
- B. Arcot
- et al.
- 1996
- MRS Spring Meeting 1996
Dependence of crystallographic texture of C54 TiSi2 on thickness and linewidth in submicron CMOS structures
- V. Svilan
- K.P. Rodbell
- et al.
- 1996
- MRS Spring Meeting 1996
Reduction of the C54-TiSi2 phase transformation temperature using refractory metal ion implantation
- R. Mann
- G.L. Miles
- et al.
- 1995
- Applied Physics Letters
Investigation of titanium silicide formation in Ti+Si reactions using infrared spectroscopy and x-ray diffraction
- K.L. Saenger
- C. Cabral Jr.
- et al.
- 1995
- Journal of Applied Physics
Light scattering measurement of surface topography during formation of titanium silicide
- C. Lavoie
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995
In situ analysis of the formation of thin TiSi2 (<50 nm) contacts in submicron CMOS structures during rapid thermal annealing
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995
A kinetic study of the C49 to C54 TiSi2 conversion using electrical resistivity measurements on single narrow lines
- K.L. Saenger
- C. Cabral
- et al.
- 1995
- Journal of Applied Physics
In situ x-ray diffraction analysis of the C49-C54 titanium silicide phase transformation in narrow lines
- R.A. Roy
- L. Clevenger
- et al.
- 1995
- Applied Physics Letters