Diffusion-reaction: Growth and nucleation
- F.M. D'Heurle
- P. Gas
- et al.
- 1997
- Defect and Diffusion Forum
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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159 results for F.M. D'Heurle
Kinetics of suicide formation measured by in situ ramped resistance measurements
- E.G. Colgan
- F.M. D'Heurle
- 1996
- Journal of Applied Physics
Precisions on reaction monitoring from in-situ resistance measurements: Relations between such measurements and actual reaction kinetics
- S.-L. Zhang
- F.M. D'Heurle
- 1996
- Thin Solid Films
Stresses during silicide formation: A review
- F.M. D'Heurle
- O. Thomas
- 1996
- Defect and Diffusion Forum
Reduction of the C54-TiSi2 phase transformation temperature using refractory metal ion implantation
- R. Mann
- G.L. Miles
- et al.
- 1995
- Applied Physics Letters
On the formation of epitaxial CoSi2 from the reaction of Si with a Co/Ti bilayer
- S.-L. Zhang
- J. Cardenas
- et al.
- 1995
- Applied Physics Letters
Kinetic studies of intermetallic compound formation by resistance measurements
- S.-L. Zhang
- F.M. d'Heurle
- 1995
- Thin Solid Films
Thermal stability of silicide on polycrystalline Si
- Q.Z. Hong
- Stella Q. Hong
- et al.
- 1994
- Thin Solid Films
Formation of a C49 TiGe2 phase during annealing a coevaporated Ti0.33Ge0.67 alloy
- Q.Z. Hong
- K. Barmak
- et al.
- 1993
- Applied Physics Letters
Stresses and morphological instabilities in silicide/polycrystalline Si layered structures
- Q.Z. Hong
- F.M. D'Heurle
- et al.
- 1993
- Applied Physics Letters