Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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35 results for D.W. Dong

Residual Stress, Chemical Etch Rate, Refractive Index, and Density Measurements on SiO₂ Films Prepared Using High Pressure Oxygen
- - E.A. Irene
  - D.W. Dong
  - et al.
- 2019
- JES
Ellipsometry Measurements of Polycrystalline Silicon Films
- - E.A. Irene
  - D.W. Dong
- 2019
- JES
An XPS and TEM Study of Intrinsic Adhesion Between Polyimide and Cr Films
- - N.J. Chou
  - D.W. Dong
  - et al.
- 2019
- JES
Observation of amorphous silicon regions in silicon-rich silicon dioxide films
- - A. Hartstein
  - J.C. Tsang
  - et al.
- 2008
- Applied Physics Letters
Dual electron injector structure
- - D.J. Dimaria
  - D.W. Dong
- 2008
- Applied Physics Letters
High current injection into SiO₂ from Si rich SiO₂ films and experimental applications
- - D.J. DiMaria
  - D.W. Dong
- 2008
- Journal of Applied Physics
Charge trapping studies in SiO₂ using high current injection from Si-rich SiO₂ films
- - D.J. DiMaria
  - R. Ghez
  - et al.
- 2008
- Journal of Applied Physics
Attenuated total reflectance study of silicon-rich silicon dioxide films
- - A. Hartstein
  - D.J. Dimaria
  - et al.
- 2008
- Journal of Applied Physics
Electron heating in silicon dioxide and off-stoichiometric silicon dioxide films
- - D.J. DiMaria
  - T.N. Theis
  - et al.
- 1985
- Journal of Applied Physics
Direct measurement of the energy distribution of hot electrons in silicon dioxide
- - S.D. Brorson
  - D.J. DiMaria
  - et al.
- 1985
- Journal of Applied Physics