Chemical sputtering of Al2O3 by fluorine-containing plasmas excited by electron cyclotron resonance
- Y.H. Lee
- Z.H. Zhou
- et al.
- 1990
- Journal of Applied Physics
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122 results for J.M.E. Harper
Room-temperature oxidation of silicon catalyzed by Cu3Si
- J.M.E. Harper
- A. Charai
- et al.
- 1990
- Applied Physics Letters
Photoemission from thin-film lanthanum hexaboride
- P.G. May
- R. Petkie
- et al.
- 1990
- Applied Physics Letters
Note on the origin of intrinsic stresses in films deposited via evaporation and sputtering
- F.M. D'Heurle
- J.M.E. Harper
- 1989
- Thin Solid Films
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- J.M.E. Harper
- S.E. Harnstram
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The angular dependence of preferential sputtering and composition in aluminum-copper thin films
- P. Rudeck
- J.M.E. Harper
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
TIN formed by ion beam nitriding of TiSi2
- S.E. Harnstrarn
- D. Moy
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A comparison between aluminum and copper interactions with high-temperature oxide and nitride diffusion barriers
- A. Charai
- S.E. Harnstram
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Angular dependence of preferential sputtering and composition in aluminum-copper thin films
- P. Rudeck
- J.M.E. Harper
- et al.
- 1988
- Applied Physics Letters
Theory of ripple topography induced by ion bombardment
- R.Mark Bradley
- James M.E. Harper
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films