Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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122 results for J.M.E. Harper

Texture formation in Ti-Ta alloy disilicide thin films
- - A.S. Özcan
  - K.F. Ludwig Jr.
  - et al.
- 2002
- Journal of Applied Physics
Nucleation and growth kinetics of preferred C54 TiSi ₂ orientations: Time-resolved x-ray diffraction measurements
- - A.S. Özcan
  - K.F. Ludwig Jr.
  - et al.
- 2002
- Journal of Applied Physics
Texture of TiSi ₂ thin films on Si (001)
- - A.S. Özcan
  - K.F. Ludwig Jr.
  - et al.
- 2002
- Journal of Applied Physics
Picosecond ultrasonics study of the vibrational modes of a nanostructure
- - G. Andrew Antonelli
  - Humphrey J. Maris
  - et al.
- 2002
- Journal of Applied Physics
Effects of alloying elements on cobalt silicide formation
- - C. Lavoie
  - C. Cabral Jr.
  - et al.
- 2002
- Journal of Electronic Materials
In situ resistivity study of copper-cobalt films: Precipitation, dissolution and phase transformation
- - S.-L. Zhang
  - J.M.E. Harper
  - et al.
- 2001
- Thin Solid Films
Formation of c54 tisi₂: Effects of niobium additions on the apparent activation energy
- - F.M. D’Heurle
  - S.-L. Zhang
  - et al.
- 2001
- Journal of Applied Physics
The use of in situ X-ray diffraction, optical scattering and resistance analysis techniques for evaluation of copper diffusion barriers in blanket films and damascene structures
- - C. Cabral Jr.
  - C. Lavoie
  - et al.
- 2001
- Thin Solid Films
Two-step codeposition process for enhanced C54-TiSi₂ formation in the Ti-Si binary system
- - A. Quintero
  - M. Libera
  - et al.
- 2001
- Journal of Applied Physics
High conductivity copper-boron alloys obtained by low temperature annealing
- - S.-L. Zhang
  - J.M.E. Harper
  - et al.
- 2001
- Journal of Electronic Materials