Poly(4‐chlorostyrene), a new high contrast negative E‐beam resist
- J. Liutkus
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
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46 results for Jane M. Shaw
Organosilicon polymers for lithographic applications
- J.M. Shaw
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Epoxy resins for deep UV lithography
- K.J. Stewart
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Surface Modification of Pmda-Oda Polyimide: Surface Structure-Adhesion Relationship
- Kang-Wook Lee
- Steven P. Kowalczyk
- et al.
- 2002
- Macromolecules
Surface Modification of BPDA-PDA Polyimide
- Kang-Wook Lee
- Steven P. Kowalczyk
- et al.
- 2002
- Langmuir
Organic transistors with low operating voltage and high mobility
- C. Dimitrakopoulos
- S. Purushothaman
- et al.
- 1999
- DRC 1999
Optical lithography: Introduction
- G. Chiu
- J.M. Shaw
- 1997
- IBM J. Res. Dev
Negative photoresists for optical lithography
- J.M. Shaw
- J. Gelorme
- et al.
- 1997
- IBM J. Res. Dev
Broadband characterization of low dielectric constant and low dielectric loss CYTUF™ cyanate ester printed circuit board material
- Alina Deutsch
- Christopher W. Surovic
- et al.
- 1996
- IEEE Transactions on Components Packaging and Manufacturing Technology Part B
Future packaging materials: Cost performance, and environmental issues
- J.M. Shaw
- Stephen L. Buchwalter
- et al.
- 1996
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry