A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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19 results for W.M. Moreau
Image collapse issues in photoresist
- John Simons
- Dario Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Recent progress in electron-beam resists for advanced mask-making
- D. Medeiros
- A. Aviram
- et al.
- 2001
- IBM J. Res. Dev
Extending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- David R. Medeiros
- Karen E. Petrillo
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
- Brian Ashe
- Christina Deverich
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse
- Darío L. Goldfarb
- Juan J. De Pablo
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999