J.C. Marinace
JES
Capillary forces naturally present during normal drying of photoresist materials were eliminated by developing a supercritical drying process. Supercritical carbon dioxide, organic solvents and surfactants were used to prevent the collapse of high-aspect-ratio structures fabricated from aqueous-based photoresist. The replacement of the aqueous rinse by n-hexane mediated by a compatible surfactant was introduced.
J.C. Marinace
JES
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
A. Reisman, M. Berkenblit, et al.
JES
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science