Kigook Song, Robert D. Miller, et al.
Macromolecules
Capillary forces naturally present during normal drying of photoresist materials were eliminated by developing a supercritical drying process. Supercritical carbon dioxide, organic solvents and surfactants were used to prevent the collapse of high-aspect-ratio structures fabricated from aqueous-based photoresist. The replacement of the aqueous rinse by n-hexane mediated by a compatible surfactant was introduced.
Kigook Song, Robert D. Miller, et al.
Macromolecules
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Robert W. Keyes
Physical Review B
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano