Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Model of Lead Loss in Pb(Mg^xNb^1-x)O^zion Beam Sputtered Thin Films
- - J.P. Doyle
  - J.J. Cuomo
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Tribochemistry at Lubricated Interfaces
- - Xiaohe Pan
  - C.S. Bhatia
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Directed sputter deposition of AlCu: Film microstructure and microchemistry
- - S.M. Rossnagel
  - J. Moser
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF₄ and CHF
- - Y. Zhana
  - D. Vender
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Adhesion durability of tantalum BPDA-PDA polyimide interfaces
- - D. Neuaroschl
  - B.K. Furman
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma
- - M. Surendra
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Infrared absorption spectroscopy for monitoring condensible gases in chemical vapor deposition applications
- - James A. O'neill
  - Michael L. Passow
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Deposition of aluminum oxide films with high refractive index
- - K.K. Shih
  - D.B. Dove
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF₄ and CHF₃
- - G.S. Oehrlein
  - Y. Zhang
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Simulation of surface topography evolution during plasma etching by the method of characteristics
- - Manoj Dalvie
  - Satoshi Hamaguchi
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films