Image placement errors in x-ray masks induced by changes in resist stress during electron-beam writing
- R.E. Acosta
- Denise Puisto
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Thin, high atomic weight refractory film deposition for diffusion barrier, adhesion layer, and seed layer applications
- S.M. Rossnagel
- C. Nichols
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Electron-beam microcolumns for lithography and related applications
- T.H.P. Chang
- M.G.R. Thomson
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Study of plastic flow in ultrasmall Au contacts
- A. Stalder
- U. Dürig
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Liner conformality in ionized magnetron sputter metal deposition processes
- S. Hamaguchi
- S.M. Rossnagel
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of x-ray lithography masks with optical lithography
- D. LaTulipe
- J.R. Maldonado
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Experimental evaluation of a 20×20 mm footprint microcolumn
- E. Kratschmer
- H.S. Kim
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Energy spread in liquid metal ion sources at low currents
- J.C. Beckman
- T.H.P. Chang
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Low-temperature magnetic resonance force detection
- K. Wago
- O. Züger
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Ionized physical vapor deposition of Cu for high aspect ratio damascene trench fill applications
- C. Nichols
- S.M. Rossnagel
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures