Study of interface abruptness of molecular beam epitaxial GaAs/AlAs superlattices grown on GaAs (311) and (100) substrates
- Y. Hsu
- W.I. Wang
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Stressing and high field transport studies on device-grade SiO2 by ballistic electron emission spectroscopy
- R. Ludeke
- H.J. Wen
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage
- D.M. Tanenbaum
- C.W. Lo
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Correlation of UVIIHS resist chemistry to dissolution rate measurements
- J. Thackeray
- T.H. Fedynyshyn
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
In-line holography using low-energy electrons and photons: applications for manipulation on a nanometer scale
- H. Schmid
- Hans-Werner Fink
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Lithography and fabrication processes for sub-100 nm scale complementary metal-oxide semiconductor
- S.J. Wind
- Y. Taur
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Diazoquinone positive photoresist for x-ray lithography
- A. Aviram
- Daniel Bucca
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Thick film positive photoresist: development and resolution enhancement technique
- D.R. McKean
- T.P. Russell
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High resolution x-ray mask repair
- P.G. Blauner
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Micromachining applications of a high resolution ultrathick photoresist
- K.Y. Lee
- N. LaBianca
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures