Growth of Facet-Free Selective Silicon Epitaxy at Low Temperature and Atmospheric Pressure
- T.O. Sedgwick
- P. Agnello
- et al.
- 2019
- JES
Publications
509 results at JES
Low Energy X-Ray and Electron Damage to IGFET Gate Insulators
- C.J. Merz
- J.R. Maldonado
- et al.
- 2019
- JES
A Two-Dimensional Process Model for Chemimechanical Polish Planarization
- J. Warnock
- 2019
- JES
Redeposition during Deep Trench Etching
- Jacob Jorne
- 2019
- JES
A Study of Luminescent Centers in Reactive-Ion-Etched Silicon
- T.D. Bestwick
- G.S. Oehrlein
- et al.
- 2019
- JES
Factors Affecting the Molybdenum Line Slope by Reactive Ion Etching
- Yue Kuo
- 2019
- JES
Electrical Properties of AI/Ti Contact Metallurgy for VLSI Applications
- C.-Y. Ting
- B.L. Crowder
- 2019
- JES
Optimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes
- S. Mehdizadeh
- J. Dukovic
- et al.
- 2019
- JES
Repassivation transients measured with thin film breaking electrodes
- G.S. Frankel
- B. Rush
- et al.
- 2019
- JES
Phosphorus-Doped Polycrystalline Silicon via LPCVD: II. Surface Interactions of the Silane/Phosphine/Silicon System
- B.S. Meyerson
- M.L. Yu
- 2019
- JES