Metrology using differential phase contrast microscopy
- Jerry C. Shaw
- 1991
- Microelectronic Engineering
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221 results at Microelectronic Engineering
Electron beam tester measurements of switching noise in VLSI circuits
- Keith A. Jenkins
- David F. Heidel
- 1991
- Microelectronic Engineering
Strain relaxation in GeSi layers with uniform and graded composition
- S.C. Jain
- P. Balk
- et al.
- 1991
- Microelectronic Engineering
Laser photoetching of doped poly(tetrafluoroethylene), substituted-PTFE, and polyimide films
- Hiroyuki Hiraoka
- Sylvain Lazare
- et al.
- 1991
- Microelectronic Engineering
GaAs opto-electronic integrated circuits for high speed optical communications
- D.L. Rogers
- 1991
- Microelectronic Engineering
Dry ridge etching of AlGaAs GRINSCH lasers
- M. Jost
- P. Buchmann
- et al.
- 1990
- Microelectronic Engineering
New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
- Michael Hatzakis
- Kevin J. Stewart
- et al.
- 1990
- Microelectronic Engineering
Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography
- Michael G. Rosenfield
- S.J. Wind
- et al.
- 1990
- Microelectronic Engineering
CW and time resolved luminescence study of dry etch damage in semiconductor wires
- B.E. Maile
- G. Mayer
- et al.
- 1990
- Microelectronic Engineering
Silylation of resist materials using di- and polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1990
- Microelectronic Engineering