Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
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16 results at SPIE Advanced Lithography 2006
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006
Adhesion between template materials and UV-cured nanoimprint resists
- Frances A. Houle
- Eric Guyer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Vinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
Direct determination of photoresist composition changes during UV exposure
- Frances A. Houle
- Vaughn R. Deline
- et al.
- 2006
- SPIE Advanced Lithography 2006