Publications

16 results at SPIE Advanced Lithography 2006

Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- - Patrick P. Naulleau
  - Clemens Rammeloo
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Adhesion between template materials and UV-cured nanoimprint resists
- - Frances A. Houle
  - Eric Guyer
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Vinyl ether resist system for UV-cured nanoimprint lithography
- - Hiroshi Ito
  - Frances A. Houle
  - et al.
- 2006
- SPIE Advanced Lithography 2006
A year in the life of an immersion lithography alpha tool at albany NanoTech
- - Michael Tittnich
  - John Hartley
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Phase calibration for attenuating phase-shift masks
- - Michael S. Hibbs
  - Timothy A. Brunner
- 2006
- SPIE Advanced Lithography 2006
Characterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- - W. Chu
  - C. Radens
  - et al.
- 2006
- SPIE Advanced Lithography 2006