Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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20 results at SPIE Advanced Lithography 2011

Visualization of the develop process
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- - Anuja De Silva
  - Linda K. Sundberg
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Critical challenges for "non-critical" layers
- - J.M. Gomez
  - I.Y. Popova
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- - Qinghuang Lin
  - Alshakim Nelson
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Performance of tri-layer process required for 22nm and beyond
- - Yayi Wei
  - Martin Glodde
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Systematic studies on reactive ion etch-induced deformations of organic underlayers
- - Martin Glodde
  - Sebastian Engelmann
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Integrated model-based retargeting and optical proximity correction
- - Kanak B. Agarwal
  - Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Single exposure contacts are dead. Long live single exposure contacts!
- - Henning Haffner
  - Martin Ostermayr
  - et al.
- 2011
- SPIE Advanced Lithography 2011