Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
- Gregory McIntyre
- Daniel Corliss
- et al.
- 2011
- SPIE Advanced Lithography 2011
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20 results at SPIE Advanced Lithography 2011
Spacer-defined double patterning for 20-nm and beyond logic BEOL technology
- Ryoung-Han Kim
- Chiew-Seng Koay
- et al.
- 2011
- SPIE Advanced Lithography 2011
Applicability of global source mask optimization to 22/20nm node and beyond
- Kehan Tian
- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
Contact patterning strategies for 32nm and 28nm technology
- Bradley Morgenfeld
- Ian Stobert
- et al.
- 2011
- SPIE Advanced Lithography 2011
EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Reconciling measurements in AFM reference metrology when using different probing techniques
- Narender Rana
- Charles Archie
- et al.
- 2011
- SPIE Advanced Lithography 2011
Performance of tri-layer process required for 22nm and beyond
- Yayi Wei
- Martin Glodde
- et al.
- 2011
- SPIE Advanced Lithography 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- Steven J. Holmes
- Cherry Tang
- et al.
- 2011
- SPIE Advanced Lithography 2011