Ion beam patterning of block copolymer thin films
- Ranulfo Allen
- John Baglin
- et al.
- 2010
- J. Photopolym. Sci. Tech.
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68 results at J. Photopolym. Sci. Tech.
Directed self-assembly on sparse chemical patterns for lithographic applications
- Joy Y. Cheng
- Alshakim Nelson
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2009
- J. Photopolym. Sci. Tech.
A new breed of wet-developable BARC materials
- Libor Vyklicky
- Wu-Song Huang
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Nanoimprint materials systems
- F.A. Houle
- D.C. Miller
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Development of new advanced resist materials for microlithography
- Hiroshi Ito
- 2008
- J. Photopolym. Sci. Tech.
Graded spin-on organic bottom antireflective coating for high na immersion lithography
- Dario L. Goldfarb
- Libor Vyklicky
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- P.R. Varanasi
- W. Li
- et al.
- 2007
- J. Photopolym. Sci. Tech.
Control of morphology orientation in lithographically patternable diblock copolymers
- Joan K. Bosworth
- Xavier Andre
- et al.
- 2007
- J. Photopolym. Sci. Tech.
Trilayer development for 193 nm immersion lithography
- Sean Burns
- Martin Burkhardt
- et al.
- 2007
- J. Photopolym. Sci. Tech.