Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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68 results at J. Photopolym. Sci. Tech.

Ion beam patterning of block copolymer thin films
- - Ranulfo Allen
  - John Baglin
  - et al.
- 2010
- J. Photopolym. Sci. Tech.
Directed self-assembly on sparse chemical patterns for lithographic applications
- - Joy Y. Cheng
  - Alshakim Nelson
  - et al.
- 2009
- J. Photopolym. Sci. Tech.
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- - Robert D. Allen
  - Phillip J. Brock
  - et al.
- 2009
- J. Photopolym. Sci. Tech.
A new breed of wet-developable BARC materials
- - Libor Vyklicky
  - Wu-Song Huang
  - et al.
- 2009
- J. Photopolym. Sci. Tech.
Nanoimprint materials systems
- - F.A. Houle
  - D.C. Miller
  - et al.
- 2008
- J. Photopolym. Sci. Tech.
Development of new advanced resist materials for microlithography
- - Hiroshi Ito
- 2008
- J. Photopolym. Sci. Tech.
Graded spin-on organic bottom antireflective coating for high na immersion lithography
- - Dario L. Goldfarb
  - Libor Vyklicky
  - et al.
- 2008
- J. Photopolym. Sci. Tech.
Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- - P.R. Varanasi
  - W. Li
  - et al.
- 2007
- J. Photopolym. Sci. Tech.
Control of morphology orientation in lithographically patternable diblock copolymers
- - Joan K. Bosworth
  - Xavier Andre
  - et al.
- 2007
- J. Photopolym. Sci. Tech.
Trilayer development for 193 nm immersion lithography
- - Sean Burns
  - Martin Burkhardt
  - et al.
- 2007
- J. Photopolym. Sci. Tech.