Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

A He and Ne diffraction study of the W(100) phase transition
- - E. Schweizer
  - C.T. Rettner
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A process for improved Al (Cu) reactive ion etching
- - C.-K. Hu
  - B. Canney
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Mixed-metal-oxide planar optical waveguides
- - G. Arjavalingam
  - Michael A. Russak
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Molecular-beam studies of the precursor-mediated dissociative chemisorption of N2 on W(100)
- - C.T. Rettner
  - E. Schweizer
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A study of voids in sputtered Si02
- - Mitchell J. Hait
  - Harris C. Jones
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Optical emission characterization of a divergent magnetic field electron cyclotron resonance source
- - John S. McKillop
  - John C. Forster
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Determination of the local electronic structure of atomic-sized defects on Si(001) by tunneling spectroscopy
- - R.J. Hamers
  - U.K. Köhler
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- - J.M.E. Harper
  - S.E. Harnstram
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High-rate reactive sputter deposition of aluminum oxide
- - Fletcher Jones
  - Joseph Logan
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The angular dependence of preferential sputtering and composition in aluminum-copper thin films
- - P. Rudeck
  - J.M.E. Harper
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films