Microstructure and properties of dual ion beam sputtered tungsten film
- A.S. Kao
- V. Novotny
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Gas/surface reactions in the chemical vapor deposition of tungsten using WF6/SiH4mixtures
- Ming L. Yu
- Benjamin N. Eldridge
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Scanning tunneling microscopy study of low-temperature epitaxial growth of silicon on sI(111 )-(7×7)
- U.K. Köhler
- J.E. Demuth
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The chemical interaction of Mn with the MoS2(0001) surface studied by high-resolution photoelectron spectroscopy
- Jeffrey R. Lince
- Thomas B. Stewart
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Competitive reactions of fluorine and oxygen with W, WSi2, and Si surfaces in reactive ion etching using CF4/O2
- Gottlieb S. Oehrlein
- J. Lennart Lindsöm
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface analysis of realistic semiconductor microstructures
- Gottlieb S. Oehrlein
- Kevin K. Chan
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A comparison between aluminum and copper interactions with high-temperature oxide and nitride diffusion barriers
- A. Charai
- S.E. Harnstram
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Nucleation of new solid phases from chemical interactions at an interface
- F.M. Heurle
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
In situ laser diagnostic studies of plasma-generated particulate contamination
- G.S. Selwyn
- J. Singh
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma characterization for a divergent field electron cyclotron resonance source
- John Forster
- William Holber
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films