The effect of cathode materials on reactive ion etching of silicon and silicon dioxide in a CF4 plasmaL.M. Ephrath1978Journal of Electronic Materials
On the effective mass and collision time of (100) Si surface electronsF. FangA.B. Fowleret al.1978Surface Science
Superlattice umklapp processes in resonant Raman scatteringG.A. Sai-HalaszA. Pinczuket al.1978Surface Science
Excited-state exchange interactions in samarium chalcogenidesF. MehranK.W.H. Stevenset al.1978Physical Review B