Novel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base-Developable ResistHiroshi ItoElizabeth Floreset al.2019JES
Kinetics of Oxygen Gas Evolution on Hydrous Rhodium Oxide FilmsEugene J.M. O'SullivanLaurence D. Burke2019JES
Growth of Facet-Free Selective Silicon Epitaxy at Low Temperature and Atmospheric PressureT.O. SedgwickP. Agnelloet al.2019JES
Plasma Etching of Silicon in SF6: Experimental and Reactor Modeling StudiesYeong-Jyh LiiJacob Jornéet al.2019JES