Dopant Segregation in CZ and MCZ Silicon Crystal Growth: A Comparison Between Experiment and Numerical Simulation
- K.M. Kim
- W.E. Langlois
- 2019
- JES
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Pitting of Sputtered Aluminum Alloy Thin Films
- G.S. Frankel
- Michael A. Russak
- et al.
- 2019
- JES
A Diffusion Model for Electron-Hole Recombination in Zn2SiO4:(Mn, As) Phosphors
- D.J. Robbins
- N. Caswell
- et al.
- 2019
- JES
Interfacial reaction between Ni and MBE-Grown SiGe alloy
- R.D. Thompson
- K.N. Tu
- et al.
- 2019
- JES
Laser-Enhanced Electrodeposition of Lead-Tin Solder
- M. Datta
- L.T. Romankiw
- 2019
- JES
Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation
- M.S. Crowder
- 2019
- JES
Reactive Ion Etching of Sputter Deposited Tantalum Oxide and its Etch Selectivity to Tantalum
- Yue Kuo
- 2019
- JES
Computer simulation of boron transport in magnetic czochralski growth of silicon
- W.E. Langlois
- 2019
- JES
High temperature process limitation on TiSi2
- C.-Y. Ting
- F.M. d'Heurle
- et al.
- 2019
- JES
The Corrosion of Carbon Black Anodes in Alkaline Electrolyte IV. Current Efficiencies for Oxygen Evolution from Metal Oxide-impregnated Graphitized Furnace Blacks
- Harvey Sokol
- Philip N. Ross
- 2019
- JES