A Mathematical Model for Silicide Oxidation
- S.-L. Zhang
- R. Ghez
- et al.
- 2019
- JES
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Corrosion Processes in Magneto-optic Films
- M.M. Farrow
- E.E. Marinero
- 2019
- JES
Combined Experimental and Modeling Study of Spatial Effects in Plasma Etching: CF4/O2 Etching of Silicon
- M. Dalvie
- K.F. Jensen
- 2019
- JES
Optimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes
- S. Mehdizadeh
- J. Dukovic
- et al.
- 2019
- JES
Factors Affecting the Molybdenum Line Slope by Reactive Ion Etching
- Yue Kuo
- 2019
- JES
Oxidation of Plasma-Deposited α-SixC1-x:H Films
- J.M. Eldridge
- J.O. Moore
- et al.
- 2019
- JES
Determination of partial currents for cuni and cuco electrodeposition using rotating ring-disk electrodes
- Jean Horkans
- I-Chia Hsu Chang
- et al.
- 2019
- JES
In Situ X-Ray Absorption Study of Chromium Valency Changes in Passive Oxides on Sputtered ALCr Thin Films Under Electrochemical Control
- A.J. Davenport
- H.S. Isaacs
- et al.
- 2019
- JES
Production and Characterization of Extremely Corrosion Resistant Chromium-Metalloid Alloys
- R.M. Latanision
- R.R. Ruf
- 2019
- JES
Feature-Size Dependence of Etch Rate in Reactive Ion Etching
- Young H. Lee
- Zhen H. Zhou
- 2019
- JES