Application of Triangular Voltage Sweep Method to Mobile Charge Studies in MOS Structures
- N.J. Chou
- 1971
- JES
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Factors Affecting the Growth Rate of Plasma Anodized Al2O3
- John F. O'Hanlon
- 1971
- JES
The Effect of Superimposed A.C. on D.C. in Electrodeposition of Ni-Fe Alloys
- Zlota Kovac
- 1971
- JES
The Chemical Polishing of Sapphire and MgAI Spinel
- A. Reisman
- M. Berkenblit
- et al.
- 1971
- JES
The Influence of the Amorphous Phase on Ion Distributions and Annealing Behavior of Group III and Group V Ions Implanted into Silicon
- Billy L. Crowder
- 1971
- JES
The In-Ga-Sb Ternary Phase Diagram
- G.M. Blom
- T.S. Plaskett
- 1971
- JES
Sodium Ion Drift through Phosphosilicate Glass-SiO2 Films
- J.M. Eldridge
- D.R. Kerr
- 1971
- JES
Surface Properties of Oxidized Germanium-Doped Silicon
- P. Balk
- 1971
- JES
Behavior of Te in Vapor-Grown GaP
- R.C. Taylor
- 1971
- JES
The Effect of Water on the Dielectric Constant of Vapor Deposited Silica Films
- T.O. Sedgwick
- S. Krongelb
- 1971
- JES