The Effect of Water on the Dielectric Constant of Vapor Deposited Silica Films
- T.O. Sedgwick
- S. Krongelb
- 1971
- JES
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Thermodynamic Analysis of the lll-V Alloy Semiconductor Phase Diagrams: I. InSb-GaSb, InAs-GaAs, and InP-GaP
- L.M. Foster
- J.F. Woods
- 1971
- JES
Epitaxial Growth of GaAsxP1-x from the Liquid Phase
- K.K. Shih
- 1970
- JES
A Method for the Synthesis of BI3 for Use as a Dopant Source
- M. Berkenblit
- A. Reisman
- 1970
- JES
Anomalous Thermal Behavior of Boron-Doped Low-Temperature Ge Epitaxial Layers
- M. Berkenblit
- T.B. Light
- et al.
- 1970
- JES
The Role of Damage in the Annealing Characteristics of Ion Implanted Si
- Billy L. Crowder
- 1970
- JES
High-Dose Implantations of P, As, and Sb in Silicon: A Comparison of Room-Temperature Implantations Followed by a 550°C Anneal and Implantations Conducted at 600°C
- Billy L. Crowder
- John M. Fairfield
- 1970
- JES
The Solidus Boundary in the GaP-InP Pseudobinary System
- L.M. Foster
- J.E. Scardefield
- 1970
- JES
Effects of Material and Processing Parameters on the Dielectric Strength of Thermally Grown Si02 Films
- N.J. Chou
- J.M. Eldridge
- 1970
- JES
Negative Surface Charge in Ge MOS Structures
- T.O. Sedgwick
- S. Krongelb
- 1970
- JES