Anomalous Thermal Behavior of Boron-Doped Low-Temperature Ge Epitaxial LayersM. BerkenblitT.B. Lightet al.1970JES
Effects of Material and Processing Parameters on the Dielectric Strength of Thermally Grown Si02 FilmsN.J. ChouJ.M. Eldridge1970JES
The Deposition of Molybdenum and Tungsten Films from Vapor Decomposition of CarbonylsL.H. KaplanF.M. d'Heurle1970JES
High-Dose Implantations of P, As, and Sb in Silicon: A Comparison of Room-Temperature Implantations Followed by a 550°C Anneal and Implantations Conducted at 600°CBilly L. CrowderJohn M. Fairfield1970JES