Residual Stress, Chemical Etch Rate, Refractive Index, and Density Measurements on SiO2 Films Prepared Using High Pressure Oxygen
- E.A. Irene
- D.W. Dong
- et al.
- 2019
- JES
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Silicon Oxidation Studies: The Oxidation of Heavily B- and P-Doped Single Crystal Silicon
- E.A. Irene
- D.W. Dong
- 2019
- JES
Preparation and Some Properties of Chemically Vapor-Deposited Si-Rich SiO and Si3N4 Films
- D.W. Dong
- E.A. Irene
- et al.
- 2019
- JES
Interactions Between Cr and Pt Films: New Cr-Pt Phases
- J.E.E. Baglin
- F.M. d'Heurle
- et al.
- 2019
- JES
Effect of Plating Parameters on Electrodeposition of NiFe
- J. Horkans
- 2019
- JES
Self-Diffusion and Na-K Exchange in βand β”-Na-Gallate Fast Ion Conductors
- L.M. Foster
- D.R. Campbell
- et al.
- 2019
- JES
Investigation of Energy Traps and Phosphorescence in Zinc Silicate Phosphors by Photostimulated Emission
- I.F. Chang
- G.A. Sai-Halasz
- 2019
- JES
Electron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type Resins
- Hiroyuki Hiraoka
- Adolfo R. Gutierrez
- 2019
- JES
Selective Studies of Chemical Vapor-Deposited Aluminum Nitride-Silicon Nitride Mixture Films
- S. Zirinsky
- E.A. Irene
- 2019
- JES
Silicon Oxidation Studies: Some Aspects of the Initial Oxidation Regime
- E.A. Irene
- 2019
- JES