Top surface imaging systems utilizing poly(vinylbenzoic acid) and its ester
- Hiroshi Ito
- 1992
- J. Photopolym. Sci. Tech.
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68 results at J. Photopolym. Sci. Tech.
Alkylated poly(4-hydroxystyrene) derivatives for deep ultraviolet lithography
- D.R. McKean
- W.D. Hinsberg
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- J.M.J. Frchet
- J. Fahey
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Photochemical and photophysical studies on chemically amplified resists
- Nigel P. Hacker
- Donald C. Hofer
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Polysilane photoresists for 193 and 248 nm lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1992
- J. Photopolym. Sci. Tech.
The importance of cage versus escape reactivity in the photochemistry of onium salts
- Nigel P. Hacker
- John L. Dektar
- et al.
- 1991
- J. Photopolym. Sci. Tech.
Image hardenings by uv-, pulsed-electron beams and crosslinking agents
- Hiroyuki Hiraoka
- 1989
- J. Photopolym. Sci. Tech.
Contrast Enhancement and Resist Wall Profile Control by Surface Crosslinkage
- H. Hiraoka
- 1988
- J. Photopolym. Sci. Tech.