Polysilanes. Synthesis, structure and thermochromic behavior
R.D. Miller, G.M. Wallraff, et al.
ACS Division of Polymer Chemistry Atlanta Meeting 1991
A series of sensitizing additives for polysilane bilayer photoresists have been identified. These compounds effectively quench the fluorescence of aromatic polysilanes and greatly increase the rate of photooxidation and spectral bleaching in the solid state. Resists formulated with sensitizers such as phthalimidotriflate show increased photospeed in imaging experiments at both 248 and 193 nm. Characteristics of the resist reactions are described. © 1992, The Society of Photopolymer Science and Technology(SPST). All rights reserved.
R.D. Miller, G.M. Wallraff, et al.
ACS Division of Polymer Chemistry Atlanta Meeting 1991
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Ming L. Yu
Physical Review B
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990