Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF₄ and CHF
- - Y. Zhana
  - D. Vender
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Tribochemistry at Lubricated Interfaces
- - Xiaohe Pan
  - C.S. Bhatia
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Adhesion durability of tantalum BPDA-PDA polyimide interfaces
- - D. Neuaroschl
  - B.K. Furman
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Model of Lead Loss in Pb(Mg^xNb^1-x)O^zion Beam Sputtered Thin Films
- - J.P. Doyle
  - J.J. Cuomo
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Directed sputter deposition of AlCu: Film microstructure and microchemistry
- - S.M. Rossnagel
  - J. Moser
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Infrared absorption spectroscopy for monitoring condensible gases in chemical vapor deposition applications
- - James A. O'neill
  - Michael L. Passow
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Morphology and bonding measured from boron-nitride powders and films using near-edge x-ray absorption fine structure
- - T. Sato
  - A. Chaiken
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Role of ions in reactive ion etching
- - J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases
- - Gottlieb S. Oehrlein
  - Ying Zhang
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas
- - O. Joubert
  - G.S. Oehrlein
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films