Al Coverage of Surface Steps at SiO2 Insulated Polycrystalline Si Boundaries: Al Evaporation in Vacuum and Low Pressure ArV.J. SilvestriV.L. Rideoutet al.2019JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorrA. RayA. Reisman2019JES
An electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline siliconE.A. IreneE. Tierneyet al.2019JES
Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their EliminationA. ReismanM. Berkenblitet al.2019JES
Silicon Oxidation Studies: The Oxidation of Heavily B- and P-Doped Single Crystal SiliconE.A. IreneD.W. Dong2019JES
Selective Studies of Chemical Vapor-Deposited Aluminum Nitride-Silicon Nitride Mixture FilmsS. ZirinskyE.A. Irene2019JES
Deposition Techniques and Heat Transfer Properties of Porous AluminumV.J. SilvestriK.S. Sachar2019JES