Sung Ho Kim, Oun-Ho Park, et al.
Small
Paper
High Temperature Flow Resistance of Micron Sized Images in AZ Resists
Abstract
A simple u.v. curing process is described that renders micron sized images in AZ resists resistant to flow when heated to temperatures as high as 210° C. The u.v. treatment prevents the image flow problems usually encountered in reactive ion etching processes. © 1981, The Electrochemical Society, Inc. All rights reserved.
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